Process Sense TFS
Endpoint Sensor for Chamber Clean Processes

Process Sense TFS Endpoint Sensor for Chamber Clean Processes - click to enlarge
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The Process Sense™ TFS™ Sensor is an improvement in the traditional endpoint technique of non-dispersive infrared (NDIR). Tunable Filter Spectroscopy (TFS) is a spectroscopic technique capable of generating a "mini-scan," producing a slice of spectra in the infrared band. The scan provides absorption peaks used to select compounds and provide concentration values.

What differentiates the Process Sense TFS Sensor from NDIR-based sensors is its ability to subtract out interferent gases absorbing in the same regions of the infrared; making the Process Sense TFS Sensor more accurate when focusing on a target gas. This subtraction capability supports the simultaneous reporting of multi-components. For example, the presence of SiF4 and/or CO2 can be reported within a single scan. To learn how much more effective the Process Sense TFS Sensor is from NDIR-based sensors, read our Application Note, Optical Gas Analyzers in Modern Semiconductor Manufacturing.

The Process Sense TFS Sensor is a versatile analyzer platform that can be factory configured to detect other gases that are IR active by simply changing or adding filters.

Features & Benefits:

  • Reduce chamber clean times and cost
  • Minimize particle events
  • Reduce NF3 usage
  • Reduce power consumption
  • Increase wafer throughput of CVD tool
  • Accurate determination of chamber clean endpoint


  • Chamber clean endpoint for SiF4; Sensitivity to SiF4 down to 2 ppm
  • Analysis of gases such as NF3 and CO2


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Need help?

Contact an Application Specialist by sending an email to MKS Instruments or call 978-645-5500.